Physics · Semiconductor Fabrication
Consider the following statements regarding semiconductor processing: 1. Annealing is required to repair lattice damage caused by ion implantation. 2. The success of annealing can be measured using the Hall effect technique. Which of the statements given above is/are correct?
- 1Only 1
- 2Only 2
- 3Both 1 and 2✓
- 4Neither 1 nor 2
Correct answer
Both 1 and 2
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