Physics · Lithography
Consider the following statements regarding photolithography: I. Negative resists become more soluble upon exposure to light. II. Positive resists become more soluble upon exposure to light. III. Chrome glass is used as a mask for pattern printing. Which of the statements given above are true?
Verified Solution4 OptionsUpdated: October 2026👁️1 View
Share:
- 1Only III
- 2II and III✓
- 3Only II
- 4I and II
Correct answer
II and III
Download Single Question PDF
Save this question and verified answer as a clean study sheet with live clickable link.
👥
Share with Friends & Study Groups
Challenge your peer aspirants on WhatsApp or Telegram to solve this question!
Online Test Series
Start Free Mock Test →Preparing for Physics?
Practice full-length mock tests with real exam timers, instant score analysis, and all-India ranking.
Chapter Practice
Practice Lithography MCQs →Want more practice questions on Lithography?
Solve complete topic-wise tests with detailed solutions on GkGet.
Related Practice Questions
Recommended practice questions in Physics · Lithography