Physics · Semiconductor Devices

A semiconductor device structure consisting of a Source, Drain, Gate, and a thin silicon dioxide insulating layer represents the construction of which of the following?

Verified Solution4 OptionsUpdated: October 2026👁️1 View

1Diode
2Bipolar Junction Transistor
3MOSFET✓
4SCR

Correct answer

MOSFET

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A semiconductor device structure consisting of a Source, Drain, Gate, and a thin silicon dioxide insulating layer represents the construction of which of the following?

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A semiconductor device structure consisting of a Source, Drain, Gate, and a thin silicon dioxide insulating layer represents the construction of which of the following?

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